학술논문
Solution deposition of amorphous IZO films by ultrasonic spray pyrolysis
Document Type
Conference
Author
Source
2009 34th IEEE Photovoltaic Specialists Conference (PVSC) Photovoltaic Specialists Conference (PVSC), 2009 34th IEEE. :000309-000311 Jun, 2009
Subject
Language
ISSN
0160-8371
Abstract
Atmospheric-pressure solution deposition of the transparent conducting oxide (TCO), amorphous indium-zinc oxide (α-IZO), was investigated as an alternative to traditional vacuum-based physical vapor deposition techniques for photovoltaic applications. Solution processing is attractive due to its ease and potential to lower device manufacturing costs. Here we report on α-IZO films prepared by ultrasonic spray pyrolysis from solutions of an indium-zinc formate (IZF) precursor. Thin, crack-free, amorphous IZO films with good optical transmittance (≫75%) and conductivities of ∼34 S/cm were produced from an IZF-HNO 3 -methanol ink using joint RTP and Ar-H 2 annealing.