학술논문

Self heating and DIBL effects in 2D MoS2 based MOSFET with different gate oxide and back oxide materials
Document Type
Conference
Source
2022 International Conference on Information Science and Communications Technologies (ICISCT) Information Science and Communications Technologies (ICISCT), 2022 International Conference on. :1-3 Sep, 2022
Subject
Communication, Networking and Broadcast Technologies
Engineering Profession
General Topics for Engineers
Photonics and Electrooptics
Power, Energy and Industry Applications
Silicon compounds
Degradation
MOSFET
Thermodynamics
Logic gates
Hafnium compounds
Transistors
self-heating effect
DIBL effect
lattice temperature
thermal conductivity
two dimensional MoS2
Language
Abstract
In the paper degradation effects such as the self-heating effect and DIBL effect in 2D MoS2 based MOSFET is investigated by simulations. It is considered transistors with Al 2 O 3 and HfO 2 as gate oxide and SiO 2 and HfO 2 as back oxide (BOX). The self-heating effect (SHE) is simulated by using the thermodynamic transport model. Dependence of DIBL(drain induced barrier lowering) effect and lattice temperature in the channel center on the gate length for transistors with different gate oxide and BOX materials is considered. Transistors with channel fully covered and partly covered (only under the gate) by gate oxide is considered. It is shown that the transistors with Al 2 O 3 as gate oxide and SiO 2 as BOX materials has higher immunity against the DIBL effect and transistors with HfO 2 as gate oxide and HfO 2 as BOX materials has higher immunity against the SHE.