학술논문

Ag Ionic Memory Cell Technology for Terabit-Scale High-DensityApplication
Document Type
Conference
Source
2019 Symposium on VLSI Circuits VLSI Circuits, 2019 Symposium on. :T188-T189 Jun, 2019
Subject
Components, Circuits, Devices and Systems
Computing and Processing
Engineered Materials, Dielectrics and Plasmas
Fields, Waves and Electromagnetics
Power, Energy and Industry Applications
Signal Processing and Analysis
Microprocessors
Arrays
Alloying
Reliability
Voltage measurement
Very large scale integration
Language
ISSN
2158-5636
Abstract
We demonstrated a cross-point memory array composed of 40nm Ag ionic memory cell with sub- μ A and selectorless operation and 10-year data retention, making it a promising candidate for terabit-scale high-density memory application. Discontinuous conductive path with large and dense Ag clusters enabled 10-year retention even at sub- μ A current with keeping high non-linearity in I-V. We implemented, for the first time, the improved cell into a 40nm cross-point array and demonstrated narrow read distribution which satisfies requirements for reliable array operation.