학술논문

Fabrication and performance of a novel suspended RF spiral inductor
Document Type
Periodical
Source
IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 51(5):814-816 May, 2004
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Inductors
Microelectromechanical devices
Q factor
Resists
Language
ISSN
0018-9383
1557-9646
Abstract
A novel suspended radio frequency (RF) spiral inductor was fabricated on glass substrate by using the microelectromechanical systems (MEMS) technology. The suspended spiral inductor is sustained with the T-shaped pillars. Great improvements in Q-factor have been achieved because of the separation between the substrate and the inductor. In the fabrication process, fine polishing of the photoresist is used to simplify the processes and ensure the seed layer and the pillars contact perfectly, and dry etching technique is used to remove the seed layer. The inductance and Q-factor are measured using the HP 8722D network analyzer in the frequency range of 0.05-10 GHz. The maximum quality factor of this inductor is 37 for the inductance of 4.2 nH with a suspended height of 60 /spl mu/m. Also, the relationship between the maximum quality factor and the suspended height were studied; the maximum quality factor grows gradually with the increase of the suspended height.