학술논문

Lithography Hotspot Detection Based on Yolov5
Document Type
Conference
Source
2022 International Workshop on Advanced Patterning Solutions (IWAPS) Advanced Patterning Solutions (IWAPS), 2022 International Workshop on. :1-5 Oct, 2022
Subject
Components, Circuits, Devices and Systems
Computing and Processing
Engineered Materials, Dielectrics and Plasmas
Engineering Profession
Photonics and Electrooptics
Location awareness
Industries
Graphics
Deep learning
Conferences
Lithography
Benchmark testing
lithography
optical proximity correction (OPC)
hotspot detection
deep learning
Yolov5
Language
Abstract
Lithography hotspot detection plays an important role in the manufacturability design of integrated circuits, which affects the yield of the final product. In this paper, based on deep learning technology named Yolov5, a lithography hotspot detection method is proposed, which can localize the lithography hotspots rapidly. Using ICCAD 2012 contest benchmark 1 and the OPC post-processed simulation graphics as the datasets to conduct the experiments, the results show that the proposed algorithm can effectively improve the detection efficiency, with the recall of 96.3%, the precision of 95.3%, the average detection time of 0.7 h/mm 2 .