학술논문

Analysis of Wake-Up Reversal Behavior Induced by Imprint in La:HZO MFM Capacitors
Document Type
Periodical
Source
IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 70(5):2568-2574 May, 2023
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Iron
Capacitors
Temperature measurement
Pulse measurements
Delays
Behavioral sciences
Zirconium
ferroelectrics (FEs)
imprint
oxygen vacancy
reliability
wake-up effect
Language
ISSN
0018-9383
1557-9646
Abstract
This article focuses on in- depth examination of the imprint effect in lanthanum-doped Hf $_{{0}.{5}}$ Zr0.5O2 (La:HZO) capacitors. The first part shows the imprint effect in a single positive up negative down (PUND) measurement caused by different delays between pulses. In addition, a unique wake-up reversal behavior (i.e., current peak split in the ${I}$ ,– ${V}$ curve and pinched ${P}$ ,– ${V}$ loop) induced by imprint has been investigated in devices with two different prepolarized states (positive and negative). The results have shown that this behavior is accelerated by the bake temperature. Quantitative evaluation of the observed current peak split at each bake time and bake temperature yielded activation energy, suggesting that the wake-up reversal is due to oxygen vacancy redistribution. Moreover, corresponding models explaining how these charged defects and the polarization dipoles interact at each measurement step are proposed. Lastly, analysis of temperature-dependent field cycling characteristics suggests that the degraded wake-up of La:HZO film at high temperature can be attributed to the wake-up reversal effect being concurrent with wake-up.