학술논문
Application and control of Laser Anneal at the 65 and 45 nm node
Document Type
Conference
Author
Source
2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference Advanced Semiconductor Manufacturing Conference, 2009. ASMC '09. IEEE/SEMI. :217-219 May, 2009
Subject
Language
ISSN
1078-8743
2376-6697
2376-6697
Abstract
The application of Laser Anneal to semiconductor manufacturing is shown to have advantages and challenges for process control. We discuss some results, the implications of the real-time control mechanism on the Ultratech anneal tool, the impact of patterning effects and the use of inline data to ensure the tool achieves the target anneal condition.