학술논문
S4-P8: Applications for epitaxial lift-off of III-V materials
Document Type
Conference
Author
Source
2014 Lester Eastman Conference on High Performance Devices (LEC) Lester Eastman Conference on High Performance Devices (LEC), 2014. :1-3 Aug, 2014
Subject
Language
Abstract
Epitaxial lift-off (ELO) is a disruptive technology that can enable substantial performance enhancement and cost reduction for epitaxially grown III-V devices [1],[2],[3],[4]. MicroLink Devices, Inc (MLD) is a recognized technological leader in the field of compound semiconductor growth and high efficiency solar cell manufacturing. ELO is a process that involves selectively etching a “release” layer to detach the epitaxially grown functional III-V material from the substrate on which it is grown. The ELO process can be used on a variety of device architectures from solar cells to heterojunction bipolar transistors (HBTs) and light emitting diodes (LEDs).