학술논문
Cost effective reticle quality management strategies in wafer fabs
Document Type
Conference
Author
Source
10th Annual IEEE/SEMI. Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 99 Proceedings (Cat. No.99CH36295) Semiconductor manufacturing 99 Advanced Semiconductor Manufacturing Conference and Workshop, 1999 IEEE/SEMI. :254-258 1999
Subject
Language
ISSN
1078-8743
Abstract
A statistically based methodology has been developed to plan and/or optimize the use of reticle inspection capacity in the fab. Statistical methods are used to analyze reticle and product data which are combined, in a stochastic model, with financial parameters. The model uses the combined information to calculate the cost of different reticle inspection strategies, allowing both capacity planning and allocation optimization of given inspection capacity. In this paper we present the reticle inspection planning problem, our solution methodology, excerpts of data analysis performed, and an example inspection planning calculation.