학술논문
On the fly oxide trap (otfot) concept: A new method for bias temperature instability characterization
Document Type
Conference
Source
2012 19th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits Physical and Failure Analysis of Integrated Circuits (IPFA), 2012 19th IEEE International Symposium on the. :1-5 Jul, 2012
Subject
Language
ISSN
1946-1542
1946-1550
1946-1550
Abstract
In this paper, a new method, named on the fly oxide trap (OTFOT), is proposed to extract the bias temperature instability BTI in MOS transistors. It is based on charge pumping technique (CP) at low and high frequencies. We emphasize on the theoretical-based concept, giving a clear insight on the easy-use of the OTFOT methodology and demonstrating its viability to characterize the negative BTI (NBTI). Using alternatively high and low frequencies, OTFOT method separates the interfacetraps (ΔN it ) and border-trap (ΔN bt ) (switching oxide-trap) densities independently as well as their contributions to the threshold voltage shift (ΔV th ), without needing additional methods. OTFOT method can contribute to further understand the behavior of the NBTI degradation, especially through the threshold voltage shift components such as ΔV it and ΔV ot caused by interface-trap and border-trap, respectively.