부산대학교 도서관

Inductively coupled plasma sources driven by RF power at low-pressure regimes are well adopted for high-volume manufacturing of semiconductor devices. One vexing challenge to the utility of these plasma processing reactors is the existence of the E–H-mode transition. Industry notably avoids the process region associated with this transition, where plasma instabilities and bimodal power coupling prohibit reliable RF power delivery. One plasma instability detailed in this paper is associated with a hysteresis in coupled RF power (current) varying for the E-mode, or weakly capacitive coupling to the plasma, in comparison to the stronger current coupling in the H-mode, where inductive coupling is preferentially dominant. As a result, approximately two orders of magnitude of electron density is relinquished in this transition region from serving industrial manufacturing processes. We characterize the plasma parameter variation through the E-mode to H-mode with a time-resolved measurement of the electron density. Electronegative chemistries are incorporated into our experimental setup. The experimental scheme serves to evaluate RF power delivery and ameliorate its coupling through the transition region. We seek to extend this paper to adopt more efficient power coupling for toroidal plasma sources.