학술논문

Fundamental Power and Frequency Limits of Deeply-Scaled CMOS for RF Power Applications
Document Type
Conference
Source
2006 International Electron Devices Meeting Electron Devices Meeting, 2006. IEDM '06. International. :1-4 Dec, 2006
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Photonics and Electrooptics
Radio frequency
Power generation
CMOS process
Power amplifiers
CMOS technology
Voltage
Radiofrequency amplifiers
Frequency estimation
Fingers
Power measurement
Language
ISSN
0163-1918
2156-017X
Abstract
This study compares the RF power performance of 65 nm and 0.25 μm CMOS devices integrated on an advanced 65 nm process, and discusses their power and frequency limitations for the first time. We demonstrate output power levels of about 80 mW for 65 nm devices, and 450 mW for 0.25 μm devices when operated at their nominal voltages of 1.0 and 2.5 V respectively. We find that output power as well as the maximum frequency is limited by parasitic resistances in the backend. Our results provide insight into the performance potential of RF power amplifiers integrated into advanced CMOS technologies in SoC applications.