학술논문

Enhanced UV Photodetector Response of ZnO/Si With AlN Buffer Layer
Document Type
Periodical
Source
IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 64(10):4161-4166 Oct, 2017
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Zinc oxide
II-VI semiconductor materials
Photodetectors
Silicon
Aluminum nitride
III-V semiconductor materials
Buffer layers
Detectivity
electrical characterization
high-resolution X-ray diffraction (HRXRD)
internal photoconductive gain
photoluminescence (PL)
pulsed laser deposition
ultraviolet (UV) photodetectors
ZnO thin films
Language
ISSN
0018-9383
1557-9646
Abstract
Studies have been carried out on the enhancement of responsivity and detectivity of the ZnO thin-films-based ultraviolet photodetectors by introducing an AlN buffer layer on silicon substrate. The ZnO film grown with AlN buffer layer established an epitaxial relation with the substrate and was found to show improved crystallinity with excellent optical properties. A strong and narrow photoluminescence emission was observed on the ZnO film grown with buffer layer, while a defect related broad emission was dominated on the film without buffer layer. The photodetectors showed a higher responsivity ( $R_{\lambda }$ ) of ${1.03} \times {10}^{{{{4}}}}$ A/W with a specific detectivity ( $D^{\ast }$ ) of ${5.21} \times {10}^{{{{12}}}}~ \text {cm}\cdot \text {Hz}^{{{{1/2}\cdot }}}\text {W}^{{{\text {-1}}}}$ at an applied bias of 3 V due to their excellent crystal quality.