학술논문

Very high voltage planar devices using field plate and semi-resistive layers: design and fabrication
Document Type
Conference
Source
2000 International Semiconductor Conference. 23rd Edition. CAS 2000 Proceedings (Cat. No.00TH8486) Semiconductor conference Semiconductor Conference, 2000. CAS 2000 Proceedings. International. 1:363-366 vol.1 2000
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Voltage
Fabrication
Silicon
Diodes
Anodes
Laboratories
Electrodes
Electric variables
Insulation
Oxygen
Language
Abstract
An efficient junction termination technique for 4 kV devices is presented. The complementarity of a field plate and a semi-resistive layer is shown allowing us to fabricate planar devices with a very high breakdown voltage and to decrease the silicon area consumed. The dynamic behaviour of SIPOS terminated diodes is physically explained and modelled. A solution to improve the dynamic behaviour up to 3000 V//spl mu/s is proposed. The following describes the complete design, electrical characteristics and fabrication of 4 kV planar diodes.