학술논문

Understanding the impact of slow electro-forming in Resistive Random Access Memories
Document Type
Conference
Source
2013 IEEE 56th International Midwest Symposium on Circuits and Systems (MWSCAS) Circuits and Systems (MWSCAS), 2013 IEEE 56th International Midwest Symposium on. :85-88 Aug, 2013
Subject
Bioengineering
Communication, Networking and Broadcast Technologies
Components, Circuits, Devices and Systems
Computing and Processing
Photonics and Electrooptics
Power, Energy and Industry Applications
Robotics and Control Systems
Signal Processing and Analysis
Capacitance
Dielectrics
Capacitance-voltage characteristics
Voltage measurement
Random access memory
Testing
Hafnium compounds
Resistive Random Access Memory (ReRAM)
Transition Metal Oxide
Non-Volatile Memories
Language
ISSN
1548-3746
1558-3899
Abstract
We report an experimental study to understand the reduction in the forming voltage with slow electro-forming of HfO 2 based ReRAM devices. Using a combination of capacitance-voltage and current-voltage measurements, we captured the change in capacitance due to dielectric polarization as function of voltage sweep rates. The dielectric polarization was attributed to the charge trapping or internal redistribution of charged centers under electric field. Retention testing showed that this change in capacitance was volatile and decayed to initial values over time after the removal of bias indicating a dielectric relaxation. The dielectric polarization was significantly higher when voltage-sweep rate was slow which causes electro-forming of the dielectric at lower forming voltages.