학술논문
Sensitivity analysis of C-V global variability for 28 nm FD-SOI
Document Type
Conference
Author
Source
2017 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) Ultimate Integration on Silicon (EUROSOI-ULIS), 2017 Joint International EUROSOI Workshop and International Conference on. :132-135 Apr, 2017
Subject
Language
ISSN
2472-9132
Abstract
This work describes a statistical model for the C-V global variability of 28 nm FD-SOI using the sensitivities of the capacitance to each process parameter calculated using Leti-UTSOI compact model. The percentage contribution of each process parameter to the total C-V variation is explored to identify the dominant source of variation at different bias conditions. The proposed model provides an alternate method to directly extract the variance of the process parameters from the measured C-V variability.