학술논문

A novel dry-type glucose sensor based on a metal-oxide-semicoductor capacitor (MOSC) structure with HRP+GOD catalyzing layer
Document Type
Conference
Source
2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on. :652-654 Oct, 2006
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Sugar
Capacitive sensors
Capacitors
Dielectrics
Testing
Coatings
Capacitance-voltage characteristics
Silicon
Leakage current
Linearity
Language
Abstract
The paper propose a novel dry-type glucose sensor based on the MOSC structure using a SiO 2 gate dielectric in conjunction with an HRP (horseradish peroxidase) + GOD (glucose oxidase) catalyzing layer. The tested glucose solution was dropped directly onto the window opened on the SiO 2 , with a coating of HRP+GOD catalyzing layer on top of the gate dielectric. From the C-V characteristics of the MOSC found that the glucose solution can induce an inversion layer on the silicon surface causing a gate leakage current flowing along the SiO 2 surface. The gate current changes DeltaI before and after the drop of glucose solution exhibits a near-linear relationship with increasing glucose concentration. The highest linearity occurs when the gate is forward biased at +4V and +5V. The DeltaI sensitivity is about 1.76 nA/cm 2 /M, and the current is quite stable 20 to 30 min after the drop of the glucose solution