학술논문

Energy and Disturbance Analysis of 1T-DRAM With Nanowire Gate-All-Around RFET
Document Type
Periodical
Source
IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 71(5):2950-2956 May, 2024
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Gallium arsenide
Transistors
Logic gates
Energy consumption
Random access memory
Tunneling
Degradation
1T-DRAM
disturbance
energy
latency
nanowire
reconfigurable transistor (RFET)
retention
Language
ISSN
0018-9383
1557-9646
Abstract
The influence of the number of bias levels for realizing capacitorless dynamic random access memory (DRAM) in nanowire (NW) gate-all-around (GAA) reconfigurable transistor (RFET) is analyzed through simulations. Although a careful selection of bias levels can enhance retention (1.8 s at 85 °C), reduce energy consumption ( $\sim $ 0.3 fJ), and enhance current ratio (CR) ( $\sim 10^{{5}}$ ) in NW GAA RFET, bias-induced word line (WL) and bitline (BL) disturbance in an array can limit 1T-DRAM performance. It is shown that NW GAA RFET DRAM exhibits immunity from all six BL disturbances up to 5 ms while WL disturbance is critical as three out of six possible cases are disturbed.