학술논문
Analysis of the uniformity of the localized area epitaxy by spectrally resolved scanning photoluminescence
Document Type
Conference
Author
Source
Proceedings of 8th International Conference on Indium Phosphide and Related Materials Indium phosphide and related materials Indium Phosphide and Related Materials, 1996. IPRM '96., Eighth International Conference on. :23-26 1996
Subject
Language
Abstract
In this contribution, room temperature spectrally resolved scanning photoluminescence technique with high spatial resolution (1 /spl mu/m) is introduced and applied to control the uniformity of the composition and of the thickness of quantum well (QW) structures obtained by localized area epitaxy. Furthermore, this technique is applied here to study lateral uniformity of QW InGaAs/InP heterostructures grown by localized area gas source molecular beam epitaxy (GSMBE) at various conditions (temperature, arsine flow rate) and as a function of stripe width and spacing.