학술논문

GH25-10: New qualified power GaN HEMT process from technology to product overview
Document Type
Conference
Source
2014 9th European Microwave Integrated Circuit Conference European Microwave Integrated Circuit Conference (EuMIC), 2014 9th. :225-228 Oct, 2014
Subject
Aerospace
Communication, Networking and Broadcast Technologies
Components, Circuits, Devices and Systems
Fields, Waves and Electromagnetics
Photonics and Electrooptics
Logic gates
Gallium nitride
Reliability
Current measurement
HEMTs
Qualifications
GaN HEMT
process
power
efficiency
reliability
Interodulation
Language
Abstract
The performances and the results of the qualification plan of the new high power GaN HEMT process GH25-10 are summarized in this paper. This technology would be the first ¼ gate length process qualified in Europe on 4” SiC substrate and will be fully open in foundry mode mid of 2014. It addresses applications up to 20 GHz with state of the art figure of merits in term of power density, gain, efficiency and reliability. The first part is dedicated to the description of the process and the associated spread data analysis. A second part is focused on the review of the performances, the electrical domain of validity (operating ratings) and modeling capabilities. This view is completed by some results of the qualification process. Finally, the last part will be focused on the product development based on the GH25-10 GaN technology.