학술논문

Thermally actuated microprobes for a new wafer probe card
Document Type
Periodical
Source
Journal of Microelectromechanical Systems J. Microelectromech. Syst. Microelectromechanical Systems, Journal of. 8(1):43-49 Mar, 1999
Subject
Engineered Materials, Dielectrics and Plasmas
Components, Circuits, Devices and Systems
Probes
Micromechanical devices
Prototypes
Testing
Heating
Surface resistance
Ohmic contacts
Bonding
Contact resistance
Electrical resistance measurement
Language
ISSN
1057-7157
1941-0158
Abstract
A new type of MEMS microprobe was designed and fabricated which can be used for a nest generation wafer probe card. A prototype MEMS probe card consisting of an array of microprobes individually actuated by bimorph heating to make contact with the test chip was also fabricated. This probe card is called the CHIPP (Conformable, HIgh-Pin count, Programmable) card and can be designed to contact up to 800 I/O pads along the perimeter of a 1-cm/sup 2/ chip with a microprobe repeat distance of approximately 50 /spl mu/m. Microprobes for a prototype CHIPP probe card have been fabricated with a variety of cantilever structures including Al-SiO/sub 2/, W-SiO/sub 2/ and Al-Si bimorphs, and with the resistive heater placed either inside or on the surface of the cantilever. Ohmic contacts between tips and bond pads were tested with contact resistance as low as 250 m/spl Omega/. The deflection efficiency varies from 5.23-9.6 /spl mu/m/mW for cantilever lengths from 300-500 /spl mu/m. The maximum reversible deflection is in the range of 280 /spl mu/m. The measured resonant frequency is 8.16 kHz for a 50/spl times/500 /spl mu/m device and 19.4 kHz for a 40/spl times/300 /spl mu/m device. Heat loss for devices operating in air was found to be substantially higher than for vacuum operation with a heat loss ratio of about 2/1 for a heater inside the structure, and 4.25/1 for a structure with the heater as an outer layer of the cantilever.