학술논문
3D source/drain doping optimization in Multi-Channel MOSFET
Document Type
Conference
Author
Source
2010 Proceedings of the European Solid State Device Research Conference Solid-State Device Research Conference (ESSDERC), 2010 Proceedings of the European. :368-371 Sep, 2010
Subject
Language
ISSN
1930-8876
2378-6558
2378-6558
Abstract
We demonstrate that the integration of in-situ doped Si Source and Drain (S/D) in three-dimensional Multi-Channel Field-Effect Transistors (MCFETs) leads to improved electrical performances. The combination of in-situ doped Selective Epitaxial Growth (SEG) and ion implantation indeed enables to drastically reduce the S/D resistance (down to 72 Ω.µm for nFET and 227 Ω.µm for pFET). Ion implantation induces a small mobility degradation, which becomes negligible in short gate length (L G ) MCFETs. Gate width down-scaling otherwise needed to suppress the overall mobility degradation with L G and obtain the best electrical properties.