학술논문

Semiconductor Evolution for Chip and System Design- From 2D Scaling to 3D Heterogeneous Integration
Document Type
Conference
Author
Source
2022 International Symposium on VLSI Design, Automation and Test (VLSI-DAT) VLSI Design, Automation and Test (VLSI-DAT), 2022 International Symposium on. :1-1 Apr, 2022
Subject
Communication, Networking and Broadcast Technologies
Components, Circuits, Devices and Systems
Computing and Processing
Photonics and Electrooptics
Power, Energy and Industry Applications
Robotics and Control Systems
Signal Processing and Analysis
Three-dimensional displays
Transistors
Very large scale integration
Topology
Three-dimensional integrated circuits
Servers
Power dissipation
Language
ISSN
2472-9124
Abstract
Summary form only given. Semiconductor systems, whether cell-phones, laptops, servers or machine learning accelerators, require an increasing number of processing units, larger caches and faster interfaces while managing cost and power dissipation. As we continue to push the transistor, interconnect and memory scaling to smaller geometries, the industry is moving quickly towards 3D heterogeneous integration for higher density, performance and faster time-to-market. This presentation will review recent market trends and focus on advances in process scaling for libraries, memories and external interfaces. We will cover several design and technology co-optimization (DTCO) techniques that enable higher transistor density and performance. One example is the 2D fin depopulation from 4 to 3 and more recently 2 fins. We will also explore heterogeneous integration, where complex systems are partitioned into multiple chiplets that are assembled in 2.5D or 3D topologies. In particular, we will discuss 3D integration performance and energy improvements, as well as mitigation techniques for cooling and yield challenges.