학술논문

Failure analysis of thermal degradation of TIM during power cycling
Document Type
Conference
Source
Fourteenth Intersociety Conference on Thermal and Thermomechanical Phenomena in Electronic Systems (ITherm) Thermal and Thermomechanical Phenomena in Electronic Systems (ITherm), 2014 IEEE Intersociety Conference on. :404-408 May, 2014
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
General Topics for Engineers
Photonics and Electrooptics
Power, Energy and Industry Applications
Materials
Electronic packaging thermal management
Thermal degradation
Degradation
Stress
Metals
Reliability
TIM
Failure Analysis
Power Cycling
Thermal Aging
Thermomechanical
Language
ISSN
1087-9870
Abstract
This paper discusses a thermal reliability testing experiment and failure analysis (FA) in 32nm SOI Si technology chip packages. Thermal performance of the TIM materials is monitored and physical failure analysis is performed on test vehicle packages post thermal reliability test. Thermomechanical modeling is conducted for different test conditions. TIM thermal degradation is observed at the chip center area in the batch of samples post power cycling (PC) test, while the TIM performance remains normal in the other batch of samples post thermal aging (TA) test. Physical FA findings after TIM bond line thickness measurement (at the chip corners and chip center) and unlidding to inspect the TIM surface morphology confirmed the failure mode is TIM to chip tearing. Finite element modeling results indicate significant difference of stress status in TIM and sealband adhesive between PC and TA test. The TIM experiences compressive stress during PC test, while it is in tensile stress during TA test.