학술논문

High performance 1.3µm InAs quantum dot lasers epitaxially grown on silicon
Document Type
Conference
Source
OFC 2014 Optical Fiber Communications Conference and Exhibition (OFC), 2014. :1-3 Mar, 2014
Subject
Communication, Networking and Broadcast Technologies
Photonics and Electrooptics
Quantum dot lasers
Waveguide lasers
Silicon
Substrates
Surface emitting lasers
Gallium arsenide
Language
Abstract
We demonstrate 1.3 µm InAs quantum dot lasers on silicon by molecular beam epitaxial growth with low thresholds (16 mA), high output power (>50 mW), high T0 (>200 K), and high temperature lasing (115 °C).