학술논문
In-line metrology for junction measurement and yield control
Document Type
Conference
Author
Source
Extended Abstracts of the Second International Workshop on Junction Technology. IWJT. (IEEE Cat.No.01EX541C) Junction technology Junction Technology, 2001. IWJT. Extended Abstracts of the Second International Workshop on. :53-56 2001
Subject
Language
Abstract
Modeling and device results demonstrate the high sensitivity of advanced transistors to small variation in junction depth. Non-destructive measurements with the Carrier Illumination/sup TM/ method correlate to NMOS drive current, RTA process variation, and small implant energy changes, demonstrating feasibility of in-line control for annealed implants.