학술논문

Exploring Phase and Bandgap Variations in Gallium Oxide Using Mist-based Chemical Vapor Deposition System
Document Type
Conference
Source
2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM) Electron Devices Technology & Manufacturing Conference (EDTM), 2024 8th IEEE. :1-3 Mar, 2024
Subject
Bioengineering
Components, Circuits, Devices and Systems
Computing and Processing
Engineered Materials, Dielectrics and Plasmas
Engineering Profession
Fields, Waves and Electromagnetics
General Topics for Engineers
Photonics and Electrooptics
Temperature measurement
X-ray scattering
Temperature
Systematics
Photonic band gap
Raman scattering
Optical variables measurement
Ga₂O₃
Mist-CVD
Phase
Wide-bandgap
Crystal growth
Language
Abstract
The present research demonstrates a thermally stable Kappa-phase Gallium Oxide (K-Ga 2 O 3 ) using an affordable Mist Chemical Vapor deposition system (MIST-CVD). A systematic growth approach has been used, which shows that the K-Ga 2 O 3 is stable at high temperatures with other polymorphs of the Ga 2 O 3 family on Sapphire Substrate. Further, the structural, morphological, and optical properties of Ga 2 O 3 films have been investigated using XRD, FE-SEM, EDAX, UV-Vis, and Raman measurements.