학술논문
Understanding the Influence of By-Products in Shaping Feature Profiles during Plasma Etching
Document Type
Conference
Author
Source
2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM) Electron Devices Technology & Manufacturing Conference (EDTM), 2024 8th IEEE. :1-3 Mar, 2024
Subject
Language
Abstract
Plasma etching is crucial in microfabrication for precise pattern transfer, but the presence of by-products can significantly impact feature quality. This study investigates the factors behind by-product formation and behavior, emphasizing the importance of modeling and simulation to analyze their impact on feature profiles. By accurately predicting by-product behavior, process engineers can optimize etch conditions, resulting in improved yield and device performance.