학술논문

A Behavioral Model for High Ge Content in Si/Si1−xGex Multi-Quantum Well Detector
Document Type
Periodical
Source
IEEE Sensors Journal IEEE Sensors J. Sensors Journal, IEEE. 18(20):8280-8286 Oct, 2018
Subject
Signal Processing and Analysis
Communication, Networking and Broadcast Technologies
Components, Circuits, Devices and Systems
Robotics and Control Systems
Silicon
Quantum well devices
Mathematical model
Temperature measurement
Silicon germanium
Predictive models
Metals
Multi-quantum well
high Ge content
microbolometer
thermionic emission current
TCR
Language
ISSN
1530-437X
1558-1748
2379-9153
Abstract
This paper presents a behavioral model for a Si/Si 1− x Ge x multi-quantum well (MQW) detector that predicts device characteristics to investigate the effect of increasing Ge content in Si/Si 1− x Ge x MQW. The modeling approach in this paper is based on a physical instead of empirical approach, which allows to obtain a predictive behavioral analysis of high Ge content with only a few fitting parameters. The model is used to simulate device transfer characteristics with respect to various amounts of Ge content used for Si 1− x Ge x layer in MQW. The simulation results of the proposed model are validated with the experimental data. The simulated and the experimental data are consistent over a wide range of Ge content varied from 30% up to 50%. The primary objective of this paper is to optimize Ge content in the Si/Si 1− x Ge x MQW detector to achieve desired thermal sensitivity measured in terms of temperature coefficient of resistance for a potential microbolometer application. This is the first study in the literature to develop such a highly predictive behavioral model of a Ge-enriched Si/Si 1− x Ge x MQW. The study also presents the effect of including the carbon delta layers at the Si/Si 1− x Ge x heterointerface on the device transfer characteristics. The effect of Ge content on the overall noise is also investigated by the noise characterization of the test devices.