학술논문

Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl/sub 2/

Document Type

Conference

Author

Caristrom, C.F.; van der Heijden, R.; Kok, A.A.M.; van der Heijden, R.W.; Karouta, F.; van der Tol, J.J.G.M.; Notzel, R.; van Veldhoven, P.J.; Salemink, H.W.M.

Source

International Conference on Indium Phosphide and Related Materials, 2005 Indium Phosphate and Related Materials Indium Phosphide and Related Materials, 2005. International Conference on. :500-503 2005

Subject

Engineered Materials, Dielectrics and Plasmas
Components, Circuits, Devices and Systems
Photonics and Electrooptics
Plasma applications
Etching
Photonic crystals
Indium phosphide
Plasma temperature
Lattices
Optical waveguides
Plasma measurements
Optical device fabrication
Heating

Language

ISSN

1092-8669

Abstract

We have investigated ICP-etching of deep photonic crystal holes in InP using solely Cl 2 as supplied etching gas. The influence of process parameters on hole geometry is discussed and optical test results are reported

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