학술논문

Effects of Scaling in SEE and TID Response of High Density NAND Flash Memories
Document Type
Periodical
Source
IEEE Transactions on Nuclear Science IEEE Trans. Nucl. Sci. Nuclear Science, IEEE Transactions on. 57(6):3329-3335 Dec, 2010
Subject
Nuclear Engineering
Bioengineering
Single event upset
Nonvolatile memory
Ionization
Floating gate
nonvolatile memory
single event effect
single event upset
single level
total ionizing
Language
ISSN
0018-9499
1558-1578
Abstract
Heavy ion single-event effect (SEE) measurements and total ionizing dose (TID) response for Micron Technology single-level cell 1, 2, 4, 8 Gb commercial NAND flash memory and multi-level cell 8, 16, 32 Gb are reported. The heavy ion measurements were extended down to LET 0.1 MeV-cm $^{2}$/mg. Scaling effects in SEE and TID response are discussed. Floating gate bit error upset cross section does not scale with feature size at high LETs, except for single-level cell 8 Gb device which is built with 51 nm processes. The threshold LET does not change with scaling. Charge pump TID degradation and standby current improves with scaling. In general, the effect of radiation is either unchanged or is less severe for highly scaled NAND flash memories.