학술논문
Ultimate lithography using proximal probes for single electron device fabrication or nano-object addressing
Document Type
Conference
Author
Source
2003 International Semiconductor Conference. CAS 2003 Proceedings (IEEE Cat. No.03TH8676) Semiconductor conference. CAS 2003 Semiconductor Conference, 2003. CAS 2003. International. 1:3-12 Vol. 1 2003
Subject
Language
Abstract
The high resolution offered by Scanning Probe Microscopes suggested that these equipment could be used to pattern features of controlled geometries at a nanometric scale, not reachable by conventional lithography techniques. Two processes for metallic or semiconducting nanofeatures patterning by Scanning Tunnelling Microscope or Atomic Force Microscope are presented.