학술논문

Development and performance evaluation of Thick-GEM
Document Type
Conference
Source
2007 IEEE Nuclear Science Symposium Conference Record Nuclear Science Symposium Conference Record, 2007. NSS '07. IEEE. 6:4645-4648 Oct, 2007
Subject
Nuclear Engineering
Power, Energy and Industry Applications
Fields, Waves and Electromagnetics
Engineered Materials, Dielectrics and Plasmas
Gas insulation
Electron multipliers
Dry etching
Electric variables measurement
Thickness measurement
Dielectrics and electrical insulation
Stability
Index Terms
Gas Electron Multiplier
dry etching
Thick-GEM
Language
ISSN
1082-3654
Abstract
A Gas Electron Multiplier with a thick insulator such as a 100 μm or 150 μm thick insulator (Thick-GEM) has been developed by dry etching successfully in Japan. The electric field inside a hole of the Thick-GEM was calculated and the basic properties of the Thick-GEM were measured. A much stronger electric field can be realized inside the hole of the Thick-GEM than that of a GEM with a 50 μm thick insulator (Standard- GEM). The Thick-GEM can attain much higher gain than the Standard-GEM and has a good gain stability within 1.0% for 9 hours. In this paper, the characteristics of the Thick-GEM are described compared with the Standard-GEM.