학술논문

Denoising Particle Beam Micrographs With Plug-and-Play Methods
Document Type
Periodical
Source
IEEE Transactions on Computational Imaging IEEE Trans. Comput. Imaging Computational Imaging, IEEE Transactions on. 9:581-593 2023
Subject
Signal Processing and Analysis
Computing and Processing
General Topics for Engineers
Geoscience
Ions
Pollution measurement
Photomicrography
Particle measurements
Atmospheric measurements
Particle beams
Noise reduction
Electron microscopy
focused ion beam
helium ion microscopy
Neyman Type A distribution
Poisson processes
Language
ISSN
2573-0436
2333-9403
2334-0118
Abstract
In a particle beam microscope, a raster-scanned focused beam of particles interacts with a sample to generate a secondary electron (SE) signal pixel by pixel. Conventionally formed micrographs are noisy because of limitations on acquisition time and dose. Recent work has shown that estimation methods applicable to a time-resolved measurement paradigm can greatly reduce noise, but these methods apply pixel by pixel without exploiting image structure. Raw SE count data can be modeled with a compound Poisson (Neyman Type A) likelihood, which implies data variance that is signal-dependent and greater than the variation in the underlying particle–sample interaction. These statistical properties make methods that assume additive white Gaussian noise ineffective. This article introduces methods for particle beam micrograph denoising that use the plug-and-play framework to exploit image structure while being applicable to the unusual data likelihoods of this modality. Approximations of the data likelihood that vary in accuracy and computational complexity are combined with denoising by total variation regularization, BM3D, and DnCNN. Methods are provided for both conventional and time-resolved measurements, assuming SE counts are available. In simulations representative of helium ion microscopy and scanning electron microscopy, significant improvements in root mean-squared error (RMSE), structural similarity index measure (SSIM), and qualitative appearance are obtained. Average reductions in RMSE are by factors ranging from 2.24 to 4.11.