학술논문

In Situ Measurement and Analysis of Low Pressure Gas Concentration Distribution Using 70-dB SNR 1,000 Frame-Per-Second Absorption Imaging System
Document Type
Conference
Source
2022 International Symposium on Semiconductor Manufacturing (ISSM) Semiconductor Manufacturing (ISSM), 2022 International Symposium on. :1-4 Dec, 2022
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
General Topics for Engineers
Photonics and Electrooptics
Power, Energy and Industry Applications
Robotics and Control Systems
Visualization
Semiconductor device measurement
Gases
Spectroscopy
Absorption
Imaging
Semiconductor device manufacture
Absorption imaging
CMOS image sensor
global shutter
SNR
in situ
gas concentration monitoring
semiconductor manufacturing
Language
Abstract
We are developing a 70-dB SNR 1,000 frame-per-second absorption imaging system, and it enables us to visualize gas concentration distribution and its dynamic behavior in a chamber for semiconductor manufacturing. In the steady-state gas flow condition, the spectrometry of NO 2 gas shows a good linear relationship between the absorbance and the partial pressure above approximately 0.1 Pa with the system. Such low partial pressure measurement enables the visualization of beginning of jet out of $\text{NO}_{2}/\text{Ar}$ mixed gases from a nozzle. Furthermore, 1,000 frame-per-second imaging enables analyses of the gas velocity distribution and its width.