부산대학교 도서관

Gain-cell embedded DRAM (GC-eDRAM) is a logic-compatible embedded memory alternative to SRAM, offering higher density, lower leakage power consumption, and an inherent two-ported functionality. However, increased leakage currents and process variations under technology scaling lead to a reduced data retention time (DRT), resulting in increased refresh power and reduced memory availability, currently limiting its implementation to planar 28-nm technologies and above. This letter presents the first gain-cell embedded DRAM (GC-eDRAM) in 16-nm FinFET technology, featuring a mixed- $V_{T}$ 3T gain-cell structure to minimize the storage node (SN) leakage. The implemented 1-Mbit 3T GC-eDRAM is fully logic-compatible and provides a $2\times $ smaller bitcell size compared to a 6T SRAM with similar design rules, offering the highest density logic-compatible memory cell in 16-nm technology. Measurement results demonstrate a 77- $\mu \text{s}$ DRT under a 600-mV $V_{\text {DD}}$ , which is over $10\times $ longer than previously reported GC-eDRAMs in 28-nm technologies. The memory was fully operational at temperatures spanning −40 °C to 125 °C and under a supply voltage as low as 450 mV, providing the lowest measured $V_{\text {DDmin}}$ and widest temperature range reported in the literature for GC-eDRAM.