학술논문

Resistive Switching by Voltage-Driven Ion Migration in Bipolar RRAM—Part I: Experimental Study
Document Type
Periodical
Source
IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 59(9):2461-2467 Sep, 2012
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Resistance
Integrated circuits
Hafnium compounds
Switches
Current measurement
Electrical resistance measurement
Voltage control
Bipolar switching
memory modeling
Resistive-switching random access memory (RRAM)
transition metal oxide
Language
ISSN
0018-9383
1557-9646
Abstract
Resistive-switching random access memory (RRAM) based on the formation and the dissolution of a conductive filament (CF) through insulating materials, e.g., transition metal oxides, may find applications as novel memory and logic devices. Understanding the resistive-switching mechanism is essential for predicting and controlling the scaling and reliability performances of the RRAM. This paper addresses the set/reset characteristics of RRAM devices based on $\hbox{HfO}_{x}$. The set process is analyzed as a function of the initial high-resistance state and of the current compliance. The reset process is studied as a function of the initial low-resistance state. Finally, the intermediate set states, obtained by set at variable compliance current, and reset states, obtained by reset at variable stopping voltage, are characterized with respect to their reset voltage, allowing for a microscopic interpretation of intermediate states in terms of different filament morphologies.