학술논문
Sub 0.2 /spl mu/m lithography on 300 mm wafer
Document Type
Conference
Author
Source
Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) Semiconductor manufacturing Semiconductor Manufacturing, 2000. Proceedings of ISSM 2000. The Ninth International Symposium on. :56-59 2000
Subject
Language
ISSN
1523-553X
Abstract
We study the performance of the current 300mm lithography tool set for sub 0.2 /spl mu/m processes. The results are discussed in terms of process capability and stability. It was determined that the non-linear errors which are much higher on 300 mm wafers than on 200 mm wafers had an influence, and this is discussed in detail. We determine the root causes for the stronger appearance of these effects and propose solutions to improve the overlay performance.