학술논문

Thin film diffusion barrier formation in PDMS microcavities
Document Type
Conference
Source
TRANSDUCERS 2009 - 2009 International Solid-State Sensors, Actuators and Microsystems Conference Solid-State Sensors, Actuators and Microsystems Conference, 2009. TRANSDUCERS 2009. International. :1051-1054 Jun, 2009
Subject
Computing and Processing
Engineered Materials, Dielectrics and Plasmas
Robotics and Control Systems
Transistors
Microcavities
Glass
Radio frequency
Plasma applications
Fluorescence
Pressure control
Thickness control
Coatings
Microfluidics
Polydimethylsiloxane
diffusion barrier
microfluidics
plasma enhanced vapor deposition
hexamethyldisiloxane
Language
ISSN
2159-547X
2164-1641
Abstract
We describe a method to form glass like thin film barrier in polydimethylsiloxane (PDMS) microcavities. The reactive fragments for the surface reaction were created from O 2 and hexamethyldisiloxane (HMDS) in RF plasma environment. The reaction is based on migration of the reactive fragments into the microcavities by diffusion, to form a glass like thin film barrier to conceal the naked surface of PDMS. The barrier successfully blocked penetration of a fluorescent dye rhodamine B (RhB) into PDMS. The thickness of the barrier could be controlled by the time of reaction and the pressure inside the reaction chamber. There is a wide range of applications of such a technique in various fields, e.g. for coating the covered surfaces of microfluidic channels, tubes, capillaries, medical devices, catheters, as well as chip-integrated capillary electrophoresis and advanced electronic and opto-fluidic packaging.