학술논문

Emerging N-Face GaN HEMT Technology: A Cellular Monte Carlo Study
Document Type
Periodical
Source
IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 57(10):2579-2586 Oct, 2010
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Logic gates
Gallium nitride
HEMTs
Aluminum gallium nitride
Performance evaluation
Transconductance
Cutoff frequency
Enhancement mode
GaN
high electron mobility transistor (HEMT)
high frequency
Monte Carlo
N-face
numerical simulation
Language
ISSN
0018-9383
1557-9646
Abstract
This paper aims to investigate the potential of the emerging N-face technology with respect to both the direct current and radio frequency performance of GaN high electron mobility transistor (HEMT) devices. High-frequency high-power state-of-the-art HEMTs were investigated with our full-band cellular Monte Carlo simulator, which includes the full details of the band structure and the phonon spectra. A complete characterization of these devices was performed using experimental data to calibrate the few adjustable parameters of the simulator. The effect of scaling the device dimensions, such as the gate length and the access region lengths, on the device performance was analyzed. In addition, the enhancement-mode configuration of the N-face structure was investigated. Our simulations showed that N-face devices represent an important step in engineering HEMT devices for delivering high power density and efficiency at microwave and millimeter-wave frequencies.