학술논문

SiGe-on-insulator symmetric lateral bipolar transistors
Document Type
Conference
Source
2015 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S) SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), 2015 IEEE. :1-2 Oct, 2015
Subject
Components, Circuits, Devices and Systems
Power, Energy and Industry Applications
Bipolar transistors
Silicon
Silicon germanium
Silicon-on-insulator
Photonic band gap
CMOS integrated circuits
Spontaneous emission
Language
Abstract
We report the first demonstration of thin-base symmetric lateral NPN bipolar transistors built on 8-inch SiGe-on-insulator (SiGe-OI) wafers with CMOS-like process. Such devices achieve the same collector current as the SOI bipolar transistor at ∼130 mV lower V BE from effective bandgap lowering, translating into lower voltage operation and power dissipation. Various techniques of Emitter engineering were studied and a novel partial HBT device structure was demonstrated with 3x reduction of hole injection into the emitter.