학술논문

Piezoelectric Strain FET (PeFET)-Based Nonvolatile Memories
Document Type
Periodical
Source
IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 70(6):3076-3084 Jun, 2023
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Nonvolatile memory
Photonic band gap
Strain
Modulation
Voltage
Nails
Metals
Ferroelectric (FE)
nonvolatile memory
piezoelectric (PE)
strain
transition metal dichalcogenides (TMDs)
Language
ISSN
0018-9383
1557-9646
Abstract
We propose nonvolatile memory (NVM) designs based on piezoelectric strain FET (PeFET) utilizing piezoelectric/ferroelectric material (PE/FE such as PZT) coupled with 2-D transition metal dichalcogenide (2-D-TMD such as MoS $_{{2}}{)}$ -based transistor. The proposed NVMs store bit information in the form of polarization ( ${P}$ ) of FE/PE, use electric-field driven ${P}$ -switching for write, and employ piezoelectricity-induced dynamic bandgap modulation of 2-D-TMD channel for bit sensing. We analyze PeFET with COMSOL-based 3-D modeling, showing that circuit-driven optimization of PeFET geometry is essential to achieve effective strain transduction and adequate bandgap modulation for NVM read. We achieve distinguishability of up to $11\times $ in binary states of PeFETs. We propose various flavors of PeFET NVMs, namely: 1) high-density (HD) NVM featuring a compact access-transistor-less bit-cell; 2) 1T-1PeFET NVM with segmented architecture, targeted for optimized write energy and latency; and 3) cross-coupled (CC) NVM offering a tradeoff between area and latency. PeFET NVMs offer up to $7\times $ smaller cell area, 66% lower write energy, 87% lower read energy, and 44% faster read compared to 2-D-FET static random access memory (SRAM). This comes at the cost of high write latency in PeFET NVMs, which can be minimized by virtue of optimized PE geometry.