학술논문

Electrical characterization of ALD Al2O3 - HfO2 and PECVD Al2O3 passivation layers for p-type CZ-Silicon PERC solar cells
Document Type
Conference
Source
2012 38th IEEE Photovoltaic Specialists Conference Photovoltaic Specialists Conference (PVSC), 2012 38th IEEE. :001077-001082 Jun, 2012
Subject
Photonics and Electrooptics
Power, Energy and Industry Applications
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Annealing
Density measurement
Charge measurement
silicon surface passivation
Al2O3
HfO2
conductance method
crystalline silicon solar cells
silicon
Language
ISSN
0160-8371
Abstract
This work characterizes p-type Silicon surface passivation using a high-k material (Al 2 O 3 or HfO 2 ) combining capacitance voltage (CV) and lifetime measurements.