학술논문

Photosensitive GeSi/TiO2 multilayers in VIS-NIR
Document Type
Conference
Source
2017 International Semiconductor Conference (CAS) Semiconductor Conference (CAS), 2017 International. :67-70 Oct, 2017
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Photonics and Electrooptics
Nonhomogeneous media
Temperature measurement
Silicon
Annealing
Films
Temperature
Nanocrystals
GeSi nanocrystals
TiO2 nanocrystals
electrical properties
photosensing
Language
Abstract
The electrical and photosensing properties correlated with structure and morphology of TiO 2 /(GeSi/TiO 2 ) 2 multilayers are investigated. The multilayers are prepared by magnetron sputtering followed by rapid thermal annealing. Studies of Raman spectroscopy, transmission electron microscopy and X-ray diffraction are carried out. Measurements of dark current versus voltage and temperature are done. The photosensing properties are studied by measuring photocurrent spectra at different temperatures. We obtain multilayers with 10–15 nm Ge 0.6 Si 0.4 nanocrystals (NCs) by annealing at 800 o C. We evidence the tunneling mechanism between neighbor NCs (T −1/2 law) in the dark current-temperature dependence. The photocurrent spectrum has a maximum with position shifting from 940 to 980 nm when the measurement temperature increases from 150 to 300 K, being due to the GeSi NCs.