학술논문
Novel Silicon-Carbon (Si:C) Schottky Barrier Enhancement Layer for Dark-Current Suppression in Ge-on-SOI MSM Photodetectors
Document Type
Periodical
Author
Source
IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 29(7):704-707 Jul, 2008
Subject
Language
ISSN
0741-3106
1558-0563
1558-0563
Abstract
This letter reports the first demonstration of an evanescent coupled germanium-on-silicon-on-insulator (Ge-on-SOI) metalsemiconductormetal (MSM) photodetector with a novel siliconcarbon (Si:C) Schottky barrier enhancement layer. Through the insertion of a Si:C barrier layer between the metal/Ge interface, the hole Schottky barrier height $\phi_{\rm bh}$ can effectively be enhanced to $\sim\kern1pt$0.52 eV above the valence band edge. As a result, significant dark-current $I_{\rm Dark}$ suppression by more than four orders of magnitude was demonstrated, leading to an impressive $I_{\rm Dark}$ of $\sim$11.5 nA for an applied bias $V_{A}$ of 1.0 V. Optical measurements performed at a photon wavelength of 1550 nm revealed the achievement of good internal responsivity and quantum efficiency of $\sim$530 mA/W and 42.4%, respectively, making such a high-performance Ge-on-SOI MSM photodetector a promising option for optical communication applications.