학술논문

Novel Silicon-Carbon (Si:C) Schottky Barrier Enhancement Layer for Dark-Current Suppression in Ge-on-SOI MSM Photodetectors
Document Type
Periodical
Source
IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 29(7):704-707 Jul, 2008
Subject
Engineered Materials, Dielectrics and Plasmas
Components, Circuits, Devices and Systems
Schottky barriers
Photodetectors
Dark current
Optical surface waves
Optical fiber communication
Absorption
Microelectronics
Silicon
Photonic band gap
Substrates
Germanium-on-silicon-on-insulator (Ge-on-SOI)
metal–semiconductor–metal (MSM) photodetector
Schottky barrier
silicon–carbon (Si:C)
Language
ISSN
0741-3106
1558-0563
Abstract
This letter reports the first demonstration of an evanescent coupled germanium-on-silicon-on-insulator (Ge-on-SOI) metalsemiconductormetal (MSM) photodetector with a novel siliconcarbon (Si:C) Schottky barrier enhancement layer. Through the insertion of a Si:C barrier layer between the metal/Ge interface, the hole Schottky barrier height $\phi_{\rm bh}$ can effectively be enhanced to $\sim\kern1pt$0.52 eV above the valence band edge. As a result, significant dark-current $I_{\rm Dark}$ suppression by more than four orders of magnitude was demonstrated, leading to an impressive $I_{\rm Dark}$ of $\sim$11.5 nA for an applied bias $V_{A}$ of 1.0 V. Optical measurements performed at a photon wavelength of 1550 nm revealed the achievement of good internal responsivity and quantum efficiency of $\sim$530 mA/W and 42.4%, respectively, making such a high-performance Ge-on-SOI MSM photodetector a promising option for optical communication applications.