학술논문

A Highly Punchthrough-Immune Array Architecture and Program Method for Floating-Gate NOR-Type Nonvolatile Memory
Document Type
Periodical
Source
IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 58(4):945-952 Apr, 2011
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Arrays
Microprocessors
Logic gates
Synthetic aperture sonar
Current measurement
Leakage current
Bit-pattern effect
cascade cell
channel-hotelectron (CHE) injection
floating diffusion region
floating gate (FG)
independent wordline (WL)
nonvolatile memory
nor flash
punchthrough (PT)
transient charging current
virtualground (VG) array
Language
ISSN
0018-9383
1557-9646
Abstract
A novel array architecture is proposed for floatinggate nor-type nonvolatile memory cells. By embedding a floating $\hbox{n}+$ region between two cells in each memory pair, punchthrough (PT) immunity is greatly improved. Since the operating cell and the cascade cell belong to two independent wordlines, bit-pattern effect on read and program characteristics is mitigated, and multilevel-cell storage can be easily realized. No additional program disturb has been found. Erase, endurance, and retention characteristics are comparable with its conventional counterpart. According to simulations, $L_{g}$ as short as 56 nm, which is projected to serve for 28 nm technology node, is feasible without suffering a serious PT effect.