학술논문
Reliability challenges in Forksheet Devices: (Invited Paper)
Document Type
Conference
Author
Source
2023 IEEE International Reliability Physics Symposium (IRPS) Reliability Physics Symposium (IRPS), 2023 IEEE International. :1-8 Mar, 2023
Subject
Language
ISSN
1938-1891
Abstract
The forksheet (FSH) device architecture is a possible candidate towards continued logic cell downscaling. It consists of vertically stacked n- and p-type sheets at opposing sides of a dielectric wall. In this work, we overview the time-0 and time-dependent performance of n and p-type FSH field-effect transistors co-integrated with nanosheets (NSH) in individual wafers. A separate assessment of dedicated capacitors yields indications of a non-negligible effect of negative fixed charges trapped in low-temperature deposited SiO 2 , currently used as dielectric wall liner. Finally, we evaluate the impact of using a bottom dielectric isolation (BDI) instead of a junction-based electrical isolation of the sheets from the substrate.