학술논문

0.13 μm HR SiGe BiCMOS Technology exhibiting 169 fs Ron x Coff Switch Performance targeting WiFi 6E Fully-Integrated RF Front-End-IC Solutions
Document Type
Conference
Source
2022 International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2022 International. :11.7.1-11.7.4 Dec, 2022
Subject
Bioengineering
Communication, Networking and Broadcast Technologies
Components, Circuits, Devices and Systems
Computing and Processing
Engineered Materials, Dielectrics and Plasmas
Fields, Waves and Electromagnetics
Photonics and Electrooptics
Power, Energy and Industry Applications
Robotics and Control Systems
Signal Processing and Analysis
Radio frequency
Performance evaluation
Insertion loss
Conductivity
Power system harmonics
BiCMOS integrated circuits
Loss measurement
Language
ISSN
2156-017X
Abstract
RF Front End Modules (FEMs) are currently achieved using CMOS Silicon-on-insulator (SOI) as the dominant technology for RF switches integration in handsets RF FEMs [1]. But for cost sensitive market requiring less stringent performances (such as WiFi), high resistivity (HR) bulk SiGe BiCMOS technology has been proposed to achieve RF FEM System on Chip (SOC) integration [2], [3]. In this paper, we review the optimization of an advanced 200-mm HR SiGe BiCMOS technology based on a previous 0.13-μm process [4]. State of the art performances have been achieved from RF switch point of view with R ON × C OFF of 169 fs and WiFi SPDT RF switch exhibiting insertion loss of ~0.8 dB @ 5.5 GHz and power handling capability exceeding 31 dBm.