학술논문

65 nm device manufacture using shaped E-Beam lithography
Document Type
Conference
Source
Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference Microprocesses and nanotechnology Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International. :158-159 2003
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Manufacturing
Lithography
Research and development
Optical attenuators
Production
Prototypes
Electron optics
Costs
Throughput
Pain
Language
Abstract
In this paper, SRAM cell device manufacture using shaped electron beam lithography was developed. TEM view of SRAM cell was showed.