학술논문

III-V Heterostructure Grown on 300mm Ge/Si Wafer for Large-Scale Fabrication of Red μ-LEDs
Document Type
Periodical
Source
IEEE Photonics Technology Letters IEEE Photon. Technol. Lett. Photonics Technology Letters, IEEE. 35(2):101-104 Jan, 2023
Subject
Engineered Materials, Dielectrics and Plasmas
Photonics and Electrooptics
Germanium
Silicon
Light emitting diodes
Current density
Fabrication
Epitaxial growth
Substrates
Red μ-LEDs
direct epitaxy
AlGaAs
silicon
300 mm
low TDD
Ge on Si
Language
ISSN
1041-1135
1941-0174
Abstract
We report on the design, fabrication and characterization of red $\mu $ -LEDs directly grown on large-scale silicon wafers through a superior-quality Ge buffer. 300mm Ge/Si substrates with a threading dislocation density (TDD) of ~107 cm−2 were successfully achieved, then followed by the growth and process of visible 649nm AlGaAs-based red emitters. The electro-optical properties of various red $\mu $ -LEDs with diameters ranging from 10 to $100\mu \text{m}$ are investigated, showing promising performances. Those results coupled with numerical analysis with a model based on transfer-matrix with dipole source-terms help us better identify the main challenges limiting the efficiencies of our devices, while providing optimization routes to alleviate them. We believe that these results could pave the way for a monolithic large-scale and low-cost integration of red $\mu $ -LEDs on 300mm Si-CMOS driving circuits and for the fabrication of high-resolution RGB microdisplays that see use in various applications in optoelectronics.